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Glass frit bonding, also referred to as glass soldering or seal glass bonding, describes a wafer bonding technique with an intermediate glass layer. It is a widely used encapsulation technology for surface micro-machined structures, e.g., accelerometers or gyroscopes.〔 This technique utilizes low melting glass ("glass solder") and therefore provides various advantages including that viscosity of glass decreases with an increase of temperature. The viscous flow of glass has effects to compensate and planarize surface irregularities, convenient for bonding wafers with a high roughness due to plasma etching or deposition. A low viscosity promotes hermetically sealed encapsulation of structures based on a better adaption of the structured shapes.〔 Further, the coefficient of thermal expansion (CTE) of the glass material is adapted to silicon. This results in low stress in the bonded wafer pair. Glass frit bonding can be used for many surface materials, e.g., silicon with hydrophobic and hydrophilic surface, silicon dioxide, silicon nitride, aluminium, titanium or glass, as long as the CTE are in the same range. This bonding procedure also allows the realization of metallic feedthroughs to contact active structures in the hermetically sealed cavity. Glass frit as a dielectric material does not need additional passivation for preventing leakage currents at process temperatures up to 125 °C.〔 Following advantages resulting in using glass frit bonding procedure:〔 * screen printing process applicable on thin, structured wafer * no electrical potentials during bonding process necessary * low tension due to low bonding temperature * selective bonding based on structured intermediate glass layer * bonding of rough wafer surfaces * no outgassing after bonding, better chemical durability, higher strength compared to organic adhesives * high reliability and stable hermetical sealing * easier process compared to metallic or eutectic layer procedures == Overview == The glass frit bond procedure is used for the encapsulation and mounting of components. The coating of glass frit layers is applied by spin coating for thickness of 5 to 30 µm or commonly by screen printing for thickness of 10 to 30 µm.〔 To achieve process temperatures beneath 450 °C leaded glass or lead silicate glass is used. The glass frit is a paste consisting glass powder, organic binder, inorganic fillers and solvents. This low melting glass paste is milled into powder (grain size < 15 µm) and mixed with organic binder forming a printable viscous paste.〔 Inorganic fillers, i.e. cordierite particles (e.g. Mg2Al3 ()) or barium silicate, are added to the melted glass paste to influence properties, i.e. lowering the mismatch of thermal expansion coefficients between silicon and glass frit.〔 The solvents are used to adjust the viscosity of the organic binder. Several glass frit pastes are commercially available, e.g. FERRO FX-11-0366, and every single one need individual handling after deposition.〔 The choice of the paste depends on various factors, i.e. deposition method, substrate material and process temperatures.〔 The glass used for MEMS applications consists of particles and lead oxide. Latter lowers the glass transition temperature below 400 °C.〔 The reduction of lead oxide by the silicon leads to the formation of lead precipitations at the silicon-glass interface. Those precipitations decrease the strength of the bond and are reliability risks that have to be considered for the lifetime predictions of the devices.〔 The printed glass frit structures are heated to form compact glass. The heating process is necessary to drive out the solvents and binder. This results in a subsequent particle fusion of the glass powder. Using mechanical pressure the wafers are bonded at elevated temperatures.〔 The procedural steps of glass frit bonding are divided into the following:〔 # Deposition of glass paste # Burn out and firing (in order to form glass layer) # Bonding process # Cooling down 抄文引用元・出典: フリー百科事典『 ウィキペディア（Wikipedia）』 ■ウィキペディアで「Glass frit bonding」の詳細全文を読む スポンサード リンク
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